With ASML's New EXE Generation, High-NA EUVL is Ready for Practical Use

High-NA EUVL With ASML's New EXE Generation, High-NA EUVL is Ready for Practical Use

2025-07-23 By Susanne Braun | Translated by AI 2 min Reading Time

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ASML, a key supplier to the chip industry, confirmed during the second-quarter 2025 financial report the delivery of the first EXE:5200B system for high-NA EUV lithography. This is expected to make high-NA EUVL ready for mass production.

The new generation of the EXE series, model 5200, promises a 60 percent productivity boost compared to the EXE:5000, according to ASML's CEO Christophe Fouquet.(Image: ASML) — The new generation of the EXE series, model 5200, promises a 60 percent productivity boost compared to the EXE:5000, according to ASML's CEO Christophe Fouquet.
(Image: ASML)

ASML is considered a key supplier to the largest chip manufacturers worldwide. One of the chipmakers relying on ASML-driven development with high-NA EUVL (High Numerical Aperture Extreme Ultraviolet Lithography) is Intel.

Some of the world's most advanced lithography machines, devices from the Twinscan EXE:5000 series, have already been delivered to Intel's facilities in Hillsboro, Oregon. Reports indicate that Intel is also the first customer to receive the new generation of these highly complex machines, the EXE:5200B system. The delivery of the first system in Q1 2025 was documented by the responsible parties in the Q2 2025 financial report from ASML.

High-NA EUVL Ready for Mass Production

"After ten years of developing High-NA EUVL, ASML's machines are ready for mass production," states a report from Tweakers. The EXE:5000 systems were primarily used for test production and research, but with the EXE:5200B machines, it should now be possible to increase productivity by 60 percent. Christophe Fouquet, CEO of ASML, discussed this during the investor Q&A following the earnings call (page 4), as noted in the transcript.

"We have delivered our first EXE:5200, the tool intended for high-volume manufacturing. The device is currently being installed. To remind you, this will provide our customers with a 60 percent productivity increase compared to the EXE:5000. We're talking about over 175 WPH [Editor's note: wafers per hour]. We are now also beginning preparations for deployment in high-volume manufacturing," said Fouquet.

The EXE:5000 was said to have a WPH of 185 under ideal conditions. Fouquet's statement regarding the WPH of the EXE:5200 likely refers to realistic net values under production conditions. How many wafers an EXE:5200 will actually produce per hour will be something customers can reveal in the future.

It will likely take some time before the first chips produced using the EXE:5200 reach the market. When and how quickly the new high-NA technology will be used productively depends on the customers themselves. At Intel, for example, the first use is planned within the framework of risk productions for the in-house 14A manufacturing process in 2027. (sb)

Twinscan EXE:5000 is ASML's most advanced lithography machine, utilizing High-NA EUVL (High Numerical Aperture Extreme Ultraviolet Lithography) (Image:ASML)

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