Lithography Imec Receives the World's Most Modern High-NA-EUV System

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With the EXE:5200, Imec is bringing high-NA-EUV into the 11.8 in clean room. The most modern system of its kind is intended to create the basis at the research institute for transferring sub-2 nm logic and future memory technologies into industry-related processes more quickly.

Imec has announced the inauguration of the ASML EXE:5200 High-NA-EUV lithography system for its recently opened 21,500 sq ft cleanroom extension. According to the research institute and the Dutch manufacturer of semiconductor production machinery, this is currently the most advanced lithography tool available on the market.

The High-NA-EUV system is directly integrated with a comprehensive suite of structuring and metrology tools and materials, and will enable Imec and its ecosystem partners to unlock the performance needed to pioneer sub-2nm logic and high-density memory technologies that will drive the rapid growth of advanced AI and high-performance computing.

"The last two years mark an important chapter for high numerical aperture (0.55 NA) EUV lithography, in which Imec and ASML together with the ecosystem have pioneered high numerical aperture EUV technology in their joint EUV lithography lab in Veldhoven (The Netherlands)," said Luc Van den hove, CEO of Imec, at the inauguration. "With the installation of the EXE:5200 High-NA-EUV lithography system in our 11.8 in cleanroom in Leuven (Belgium), we aim to bring these High-NA-EUV patterning technologies to an industry-relevant level and develop use cases for next-generation High-NA-EUV patterning. The unrivaled resolution, improved overlay performance, high throughput and a new wafer stacker that improves process stability and throughput will give our partners a decisive advantage in the faster development of sub-2 nm chip technologies. As the industry enters the Ångström era, High-NA-EUV will be a foundational competency and Imec is proud to be at the forefront by offering its partners the earliest and most comprehensive access to this technology."

"The installation of the EXE:5200 at Imec marks an important step into the Ångström era," added Christophe Fouquet, CEO of ASML. "Together, we are driving the advancement of high numerical aperture (High NA) EUV technology for the next generations of advanced storage and computing technology."

This milestone is a key part of the five-year strategic partnership between Imec and ASML, which is supported by the EU (Chips Joint Undertaking and IPCEI), the Flemish government and the Dutch government. Luc Van den hove: "As an integral part of the EU-funded NanoIC pilot line, the facility will play a crucial role in the coming decades in strengthening Europe's position as a leading location for research and development in the field of advanced semiconductors.

With the ASML EXE:5200 High-NA-EUV lithography system in Imec's clean room, Imec is clearly positioning itself as the most comprehensive development facility for advanced structuring processes.

Imec's close collaboration with leading chip manufacturers, equipment, material and resist suppliers, mask manufacturers and metrology experts enables us to accelerate learning cycles and improve process stability to develop and demonstrate state-of-the-art patterning techniques for next-generation logic and memory technology. In doing so, we are driving breakthrough innovations that will shape the future of advanced computing and AI in the years to come."

Imec expects the EXE:5200 High NA EUV lithography system to be fully qualified by the fourth quarter of 2026. In the meantime, the joint ASML-Imec High NA EUV lithography lab in Veldhoven will remain operational, ensuring continuity of research and development activities in High NA EUV for Imec and its partners in the ecosystem. (sg)

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